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BSI PD ISO/TR 15969:2021

BSI PD ISO/TR 15969:2021

$102.76

Surface chemical analysis. Depth profiling. Measurement of sputtered depth

Published By Publication Date Number of Pages
BSI 2021 22
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This document provides guidelines for measuring the sputtered depth in sputtered depth profiling.

The methods of sputtered depth measurement described in this document are applicable to techniques of surface chemical analysis when used in combination with ion bombardment for the removal of a part of a solid sample to a typical sputtered depth of up to several micrometres. The depth typically determined by this approach is between 1 nm to 500 µm.

PDF Catalog

PDF Pages PDF Title
2 National foreword
6 Foreword
7 Introduction
9 1 Scope
2 Normative references
3 Terms and definitions
10 4 Methods of determination of the sputtered depth
4.1 Crater depth measurement after sputter profiling
4.1.1 General description
4.1.2 Mechanical stylus crater depth measurement
11 4.1.3 Optical interferometry crater depth measurement
13 4.2 Comparison with sputter profiled samples having interfaces as depth markers
4.2.1 General description
4.2.2 Reference materials
14 4.2.3 Interface depth determination for layered structures by independent measurements
18 4.3 Typical applications and uncertainties of the different methods
19 Annex A Survey of typical applications and uncertainties of the different methods
20 Bibliography

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BSI PD ISO/TR 15969:2021
$102.76