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ASTM-E2245 2005

$44.96

E2245-05 Standard Test Method for Residual Strain Measurements of Thin, Reflecting Films Using an Optical Interferometer

Published By Publication Date Number of Pages
ASTM 2005 20
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1.1 This test method covers a procedure for measuring the compressive residual strain in thin films. It applies only to films, such as found in microelectromechanical systems (MEMS) materials, which can be imaged using an interferometer. Measurements from fixed-fixed beams that are touching the underlying layer are not accepted.

1.2 This test method uses a non-contact optical interferometer with the capability of obtaining topographical 3-D data sets. It is performed in the laboratory.

1.3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

PDF Catalog

PDF Pages PDF Title
1 Scope
Referenced Documents
Terminology
3 Summary of Test Method
4 Significance and Use
FIG. 1
FIG. 2
5 Interferences
FIG. 3
FIG. 4
6 Test Units
FIG. 5
FIG. 6
TABLE 1
9 FIG. 7
11 Report
Precision and Bias
TABLE 2
12 FIG. 8
FIG. 9
13 Keywords
A1. CALCULATION OF COMBINED STANDARD UNCERTAINTY
A1.1
14 A1.2
15 X1. MODIFICATIONS TO THE PROCEDURE FOR A BULK-MICROMACHINED FIXED-FIXED BEAM OR A SURFACE-MICROMACHINED FIXED-FIXED BEAM WITH TRANSITIONAL EDGES GREATER THAN 8 Āµm IN HEIGHT
X1.1
X1.2
X1.3
X1.4
X1.5
FIG. X1.1
16 FIG. X1.2
FIG. X1.3
17 X1.6
X1.7
X2. ADHERENCE OF SURFACE-MICROMACHINED FIXED-FIXED BEAM TO UNDERLYING LAYER
X2.1
FIG. X2.1
18 FIG. X2.2
FIG. X2.3
19 REFERENCES
FIG. X2.4
ASTM-E2245 2005
$44.96