ASTM-F2113:2011 Edition

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F2113-01(2011) Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications

Published By	Publication Date	Number of Pages
ASTM	2011	2

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Description

1.1 This guide covers sputtering targets used as thin film source material in fabricating semiconductor electronic devices. It should be used to develop target specifications for specific materials and should be referenced therein.

1.2 This standard sets purity grade levels, analytical methods and impurity content reporting method and format.

1.2.1 The grade designation is a measure of total metallic impurity content. The grade designation does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance.

PDF Catalog

PDF Pages	PDF Title
1	Scope Referenced Documents Terminology Impurities Classification Sampling
2	Analytical Methods Certification Keywords TABLE 1

Additional information

Standard Title	F2113-01(2011) Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications
Published Code	ASTM
Publication Date	2011
Pages Count	2

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ASTM-F2113:2011 Edition

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